1. Ultra pure water transportation in wafer cleaning process
In the semiconductor manufacturing process, ultra pure water (UPW) with a resistivity of up to 18.2 M Ω· cm is required for wafer cleaning. PFA tubes are widely used in UPW delivery systems due to their extremely low ion precipitation characteristics (such as metal ion precipitation<0.1 ppb). For example, in a semiconductor wafer fab, PFA tubes are connected to ultrapure water preparation equipment (such as reverse osmosis+EDI systems) and cleaning equipment to ensure that no metal or organic impurities are introduced during the transportation process, avoiding surface contamination of the wafer. In addition, the high temperature resistance of PFA pipes (able to withstand 200 ℃ high temperature disinfection) makes them suitable for online high-temperature cleaning (HTO) processes, effectively killing bacteria and preventing biofilm formation.

2. Polishing solution delivery in chemical mechanical polishing (CMP) system
CMP The process requires the polishing solution (containing nanoscale abrasive particles and chemical reagents) to maintain uniformity and stability during transportation. The surface roughness of PFA tube is low (Ra<0.2 μ m), which can reduce particle adhesion. At the same time, its corrosion resistance can withstand acid and alkali polishing solutions (such as KOH, NH ₄ OH solution). For example, the CMP equipment of an advanced process chip factory uses PFA tubes to connect the polishing solution supply unit. By optimizing the pipeline layout and flow rate design (usually controlled at 1-3 m/s), it ensures that the polishing solution does not layer or settle during transportation, thereby maintaining the uniformity of wafer surface flatness.

3. Accurate transportation of special process liquids
PFA tubes are used in electroplating, wet etching and other processes to transport high-risk liquids such as fluorine-containing acids (such as HF) and organic solvents (such as IPA). Its excellent chemical corrosion resistance and good mechanical strength (burst pressure ≥ 5 MPa) ensure system safety. For example, in the extreme ultraviolet photoresist delivery system used in EUV lithography machines, PFA tubes combined with dual sleeve joint design achieve zero leakage delivery, while further reducing surface roughness through electropolishing treatment to meet the requirements of nanoscale particle control.

4. Ultra high purity chemical distribution system (UCDS)
In advanced processes, UCDS needs to achieve precise distribution and mixing of multiple high-purity chemicals. The multi fluid compatibility of PFA tubing makes it an ideal choice, for example, when mixing ultra pure ammonia water, hydrogen peroxide, and sulfuric acid for wafer cleaning, PFA tubing can withstand mixed solution corrosion and achieve modular installation and maintenance through quick couplings. For example, the UCDS system of a 12 inch wafer fab uses PFA tubes to construct a multi-point distribution network, combined with online particle monitoring devices, to ensure that the particle size is controlled at Class 1 level during the chemical distribution process.